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HX6356-EHC

Description
32K x 8 STATIC RAM-SOI
File Size142KB,12 Pages
ManufacturerETC1
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HX6356-EHC Overview

32K x 8 STATIC RAM-SOI

Aerospace Electronics
32K x 8 STATIC RAM—SOI
FEATURES
RADIATION
• Fabricated with RICMOS
IV Silicon on Insulator (SOI)
0.75
µm
Process (L
eff
= 0.6
µm)
• Total Dose Hardness through 1x10 rad(SiO
2
)
• Neutron Hardness through 1x10
14
cm
-2
• Typical Operating power < 15 mW/MHz
• Dynamic and Static Transient Upset Hardness
through 1x10
11
rad(Si)/s
• Dose Rate Survivability through 1x10
12
rad(Si)/s
• Soft Error Rate of <1x10
-10
upsets/bit-day
in Geosynchronous Orbit
• Latchup Free
• Asynchronous Operation
• CMOS or TTL Compatible I/O
• Single 5 V
±
10% Power Supply
6
HX6356
OTHER
• Listed On SMD# 5962-95845
• Fast Read/Write Cycle Times
17 ns (Typical)
25 ns (-55 to 125°C)
• Packaging Options
- 36-Lead CFP—Bottom Braze (0.630 in. x 0.650 in.)
- 36-Lead CFP—Top Braze (0.630 in. x 0.650 in.)
GENERAL DESCRIPTION
The 32K x 8 Radiation Hardened Static RAM is a high
performance 32,768 word x 8-bit static random access
memory with industry-standard functionality. It is fabricated
with Honeywell’s radiation hardened technology, and is
designed for use in systems operating in harsh, transient
radiation environments. The RAM operates over the full
military temperature range and requires only a single 5 V
±
10% power supply. The RAM is available with either TTL or
CMOS compatible I/O. Power consumption is typically less
than 15 mW/MHz in operation, and less than 5 mW when
de-selected. The RAM read operation is fully asynchro-
nous, with an associated typical access time of 14 ns at 5V.
Honeywell’s enhanced SOI RICMOS
IV (Radiation Insen-
sitive CMOS) technology is radiation hardened through the
use of advanced and proprietary design, layout and pro-
cess hardening techniques. The RICMOS
IV process is a
5-volt, SIMOX CMOS technology with a 150 Å gate oxide
and a minimum drawn feature size of 0.75
µm
(0.6
µm
effective gate length—L
eff
). Additional features include
tungsten via plugs, Honeywell’s proprietary SHARP pla-
narization process, and a lightly doped drain (LDD) struc-
ture for improved short channel reliability. A 7 transistor
(7T) memory cell is used for superior single event upset
hardening, while three layer metal power bussing and the
low collection volume SIMOX substrate provide improved
dose rate hardening.
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